Method and apparatus for observing a specimen

Details Method and apparatus for observing a specimen Method and apparatus for observing a specimen

2011-05-03

2011-05-03

Souw, Bernard E (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron microscope type

C250S306000, C250S307000, C250S491100, C250S492100, C250S310000

Reexamination Certificate

active

07935927

ABSTRACT:
A method and device for observing a specimen, in which a convergent electron beam is irradiated and scanned from a desired direction, on a surface of a calibration substrate on which a pattern with a known shape is formed, and a beam SEM image of the pattern formed on the calibration substrate is obtained. An actual direction of the electron beam irradiated on the surface of the calibration substrate is calculated by use of the information about an apparent geometric deformation of the known shape on the SEM image, and the actual direction of the electron beam to the desired is adjusted direction by using information of the calculated direction. The pattern with the known shape formed on the calibration substrate has a crystal plane formed by anisotropic chemical etching.

REFERENCES:
patent: 5852298 (1998-12-01), Hatakeyama
patent: 6426501 (2002-07-01), Nakagawa
patent: 6614026 (2003-09-01), Adamec
patent: 6753518 (2004-06-01), Watanabe et al.
patent: 6765647 (2004-07-01), Nishi et al.
patent: 6852974 (2005-02-01), Kochi et al.
patent: 7164128 (2007-01-01), Miyamoto et al.
patent: 7365325 (2008-04-01), Miyamoto et al.
patent: 7476882 (2009-01-01), Nakayama et al.
patent: 2003/0218133 (2003-11-01), Petrov
patent: 2004/0262515 (2004-12-01), Motoi et al.
patent: 2004/0262516 (2004-12-01), Motoi et al.
patent: 2005/0116182 (2005-06-01), Tanaka et al.
patent: 2005/0133718 (2005-06-01), Miyamoto
patent: 2007/0114398 (2007-05-01), Miyamoto
patent: 2009/0252402 (2009-10-01), Nagano
patent: 2000-348658 (2000-12-01), None
patent: 2002-031520 (2002-01-01), None
patent: 2002-270126 (2002-09-01), None
patent: 2003-318099 (2003-11-01), None
patent: WO01/45136 (2001-06-01), None
“Characterisation of 193nm Resist Layers by CD-SEM Sidewall Imaging”, Marschner et al, Proceedings of SPIE, vol. 5038 (2003).

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