Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
Reexamination Certificate
2007-08-28
2007-08-28
Nguyen, Sang H. (Department: 2886)
Radiant energy
With charged particle beam deflection or focussing
Magnetic lens
C250S310000, C250S3960ML
Reexamination Certificate
active
10825696
ABSTRACT:
A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.
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Jiang Xinrong
Lo Chiwoei Wayne
Applied Materials Inc.
Fahmi Tarek N.
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