Method and apparatus for multiphoton-absorption exposure...

Details Method and apparatus for multiphoton-absorption exposure... Method and apparatus for multiphoton-absorption exposure...

2007-07-10

2007-07-10

Wells, Nikita (Department: 2881)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

C355S055000

Reexamination Certificate

active

10936796

ABSTRACT:
A multiphoton-absorption exposure apparatus for exposing a multiphoton absorption material by applying light to the multiphoton absorption material so that the light converges at a predetermined convergence position, in which an exposure-condition control unit is provided for changing an exposure condition so that optical reactions are more likely to occur when the predetermined convergence position is located deeper in the multiphoton absorption material.

REFERENCES:
patent: 7166409 (2007-01-01), Fleming et al.
patent: 2001/0001607 (2001-05-01), Miyauchi et al.
patent: 2003/0052311 (2003-03-01), Inagaki et al.
Shoji Maruo, et al., “Three-dimensional microfabrication with two-photon-absorbed photopolymerization”, Optic Letters, vol. 22, No. 2, Jan. 15, 1997, pp. 132-134.
Yoshihiko Adachi, et al., “Two-Photon-absorption Optical-fabrication with a Micro-lens Array”, Extended Abstracts (The 50thSpring Meeting, 2003); The Japan Society of Applied Physics and Related Societies 27p-YN-4, Mar. 2003.

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