Method and apparatus for monitoring the processing of a material

Drying and gas or vapor contact with solids – Material treated by electromagnetic energy

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

34269, 374129, F26B 334

Patent

active

053677862

ABSTRACT:
A method and apparatus are provided for determining a process parameter of a material in a processing system having two containers. The material being monitored is disposed in one container and a single thermal energy control device is applied to both containers. The heat flux of each container is determined while the single thermal control device is applied to both containers. The process parameter is determined in accordance with the determined heat flux. The thermal energy control device may be a single heating surface for warming the two containers, or a cooling device such as a refrigerator. The process parameter may be the drying rate of the material and the drying rate can be determined during the processing of the material. The drying rate and the percent of drying can be displayed and the thermal energy level of the containers can be controlled according to the determined drying rate. A calibration procedure for calibrating the apparatus is also provided.

REFERENCES:
patent: 2360108 (1944-10-01), Christie
patent: 2427786 (1947-09-01), Hoyler
Thermal Analysis, DuPont, Jun. 1963.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for monitoring the processing of a material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for monitoring the processing of a material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for monitoring the processing of a material will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-66867

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.