Gas and liquid contact apparatus – Contact devices
Patent
1997-09-12
2000-08-08
Bueker, Richard
Gas and liquid contact apparatus
Contact devices
118726, B01F 304
Patent
active
060989645
ABSTRACT:
In a method and apparatus for producing a vapor which serves as a chemical processing material by delivering a carrier gas and a reactive liquid to a vaporizer in which the vapor is produced, the operating state of the vaporizer is monitored by measuring the pressure of the carrier gas being delivered to the vaporizer and producing a detectable indication when the measured pressure exceeds a given value.
REFERENCES:
patent: 4436674 (1984-03-01), McMenamin
patent: 4553431 (1985-11-01), Nicolai
patent: 4783343 (1988-11-01), Sato
patent: 5204314 (1993-04-01), Kirlin
patent: 5362328 (1994-11-01), Gardiner
patent: 5535624 (1996-07-01), Lehmann
patent: 5760294 (1998-06-01), Lehmann
Search Report issued on Dec. 21, 1998 in PCT/US98/17742.
Ossart, et al, Effect of Metal-Organic Composition Fluctuation on the Atmospheric-Pressure Metal-Organic Vapor Phase Epitaxy Growth of GaAlAs/GaAs/InP Structures; J.J.App.Phys., vol. 30, No. 5A, May 1991, pp. L783-L785.
Kondah & Ohta, Chemical vapor deposition of aluminum from dimethylaluminumhydride (DMAH): Characteristice of DMAH vaporizati and Al growth kinetics; J.Vac.Sci.Technol.A 13(6) Nov./Dec. 1995.
U.S. application No. 09/064,401 (Atty. Dkt. 1515/PVD/DV).
Jun. 30, 1998 Declaration of John V. Schmitt.
U.S. application No. 08/870,961, filed Jun. 6, 1997 (Atty. Dk. #1688/PVD/DV).
U.S. application No. 08/922,510, filed Sep. 3, 1997 (Atty. Dk. #2036/PVD/DV).
Applied Materials Inc.
Bueker Richard
Glenn Benjamin
LandOfFree
Method and apparatus for monitoring the condition of a vaporizer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for monitoring the condition of a vaporizer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for monitoring the condition of a vaporizer will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1142626