Method and apparatus for monitoring layer processing

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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427 8, 427 10, 20419213, 20419233, 356381, G01N 2100

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active

054034337

ABSTRACT:
The method and apparatus of the invention permit in situ determinations to be made of the temperature and optical constants of a substrate surface that is being treated, by measurements of radiance, reflectance and transmittance. These determinations in turn provide, at any given instant during processing, compositional and other information, thereby affording highly effective feedback control of the processing conditions. The apparatus comprises an integrated, small and relatively inexpensive instrument for process monitoring.

REFERENCES:
patent: 2844032 (1958-07-01), Tandler et al.
patent: 2878388 (1959-03-01), Bergson
patent: 4172383 (1979-10-01), Iuchi
patent: 4332833 (1982-06-01), Aspnes et al.
patent: 4415402 (1983-01-01), Gelernt et al.
patent: 4417822 (1983-11-01), Stein et al.
patent: 4465382 (1984-08-01), Iuchi et al.
patent: 4493745 (1985-01-01), Chen et al.
patent: 4590574 (1986-05-01), Edmonds et al.
patent: 4652755 (1987-03-01), Solomon et al.
patent: 4695700 (1987-09-01), Provence et al.
patent: 4791296 (1988-12-01), Carpio
patent: 4874240 (1989-10-01), Watts et al.
patent: 4905170 (1990-02-01), Forouhi et al.
patent: 4919542 (1990-04-01), Nulman et al.
patent: 4974182 (1990-11-01), Tank
patent: 5091320 (1992-02-01), Aspnes et al.
patent: 5213985 (1993-05-01), Sandroff et al.
patent: 5220405 (1993-06-01), Barbee et al.
patent: 5229303 (1993-07-01), Donnelly, Jr. et al.
patent: 5277747 (1994-01-01), Aspnes
patent: 5294289 (1994-03-01), Heinz et al.
patent: 5313044 (1994-05-01), Massoud et al.
Byffeteaut Desbat-"Thin-Film Optical Constants Determined From Infrared Reflectance and Transmittance Measurements" (Applied Spectroscopy) vol. 43, No. 6, 1989-pp. 1027-1032.

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