Method and apparatus for monitoring generation of liquid chemica

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2611191, 2611211, C23C 1600

Patent

active

059721170

ABSTRACT:
In a method and apparatus for producing a vapor containing a liquid chemical by bubbling a carrier gas through a mass of the liquid chemical, vapor production is monitored by: determining successive values of the pressure of the carrier gas being delivered to the mass of liquid chemical, over a time period; and calculating, on the basis of the successive values of the pressure, the frequency of bubble formation during the bubbling of the carrier gas.

REFERENCES:
patent: 4393013 (1983-07-01), McMenamin
patent: 4553431 (1985-11-01), Nicolai
patent: 5535624 (1996-07-01), Lehmann
patent: 5760294 (1998-06-01), Lehmann
PCT search report issued in application No. PCT/US98/09702.
Guillot, A. and Dantzer, P., Determination of Volumes by Gas Expansion, Journal of Physics E/Scientific Instruments; vol. 19 (1986) Dec. No. 12, Woodbury NY, USA.
Search Report issued on Dec. 21, 1998 in PCT/US98/18451.
U.S. Patent Appln. Serial No. 09/094,401 filed Apr. 22, 1998 (Atty.Dkt. 1715/MD/PVD/DV).
U.S. patent application serial No. 08/928,371, filed Sep. 12, 1997 (Atty. Dk. # 2041/PVD/DV).
U.S. patent application serial No. 08/870,961, filed Jun. 6, 1997 (Atty. Dk. #1688/PVD/DV).
U.S. Serial No. 09/064,401 Jun. 30, 1998 Declaration of inventor, John V. Schmitt.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for monitoring generation of liquid chemica does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for monitoring generation of liquid chemica, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for monitoring generation of liquid chemica will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-759339

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.