Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1989-11-09
1992-04-07
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430 5, 430313, 430297, 427 96, 378 24, 378 34, 378119, 378 35, G03C 500
Patent
active
051027763
ABSTRACT:
An x-ray microlithography method and apparatus for integrated circuit wafers is disclosed in which an isotropic x-ray source is formed at the cross point of two crossed conductors. When a high current is passed through the conductors they vaporize and breakdown to form an ionized plasma which is hot enough at the cross point that K-shell x-ray radiation is released uniformly in all directions. The magnetic pressure caused by the current flow at the cross point is strong enough to collapse or pinch the plasma radially so that the x-ray source spot is very small in size and can provide high resolution exposure of an integrated circuit photoresist pattern. Due to the isotropic nature of the x-ray source, multiple circuit wafers can be exposed with a single x-ray pulse by disposing them radially around the source. Sequential x-ray pulses can be obtained for a circuit wafer manufacturing line by employing mechanically mounted wires, crossed conductive liquid jets, or by employing a plurality of crossed conductor pairs disposed on a rolled substrate that is sequentially advanced into contact with current feeding conductors.
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Hammer David A.
Kalantar Daniel H.
Qi Nian-Sheng
Bowers Jr. Charles L.
Cornell Research Foundation Inc.
Neville Thomas R.
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