Method and apparatus for megasonic cleaning of patterned...

Details Method and apparatus for megasonic cleaning of patterned... Method and apparatus for megasonic cleaning of patterned...

2006-05-09

2006-05-09

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

C134S137000, C134S149000, C134S157000, C134S184000, C134S185000, C134S201000, C134S902000, C156S345540, C156S345550

Reexamination Certificate

active

07040330

ABSTRACT:
A system for cleaning a semiconductor substrate is provided. The system includes transducers for generating acoustic energy oriented in a substantially perpendicular direction to a surface of a semiconductor substrate and an acoustic energy oriented in a substantially parallel direction to the surface of the semiconductor substrate. Each orientation of the acoustic energy may be simultaneously or alternately generated.

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