Method and apparatus for mechanically cleaning the edges of wafe

Details Method and apparatus for mechanically cleaning the edges of wafe Method and apparatus for mechanically cleaning the edges of wafe

1998-05-04

1999-11-02

Warden, Jill

Cleaning and liquid contact with solids

Processes

Using solid work treating agents

134902, 15 77, 15 883, 15 971, B08B 700

Patent

active

059762675

ABSTRACT:
A method and apparatus for cleaning the edges of substrates. The present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based on friction at a point of contact between the wafer and a wafer edge brush. In one embodiment, the cleaning mechanism includes a side brush that cleans the top-side or bottom-side of a wafer. The side brush is rotated by a motor that is attached to a first end of the side brush. An edge brush is attached to a second end of the side brush and is rotated along with the side brush to clean the edge of the wafer.

REFERENCES:
patent: 5144177 (1992-09-01), Rupprecht
patent: 5311634 (1994-05-01), Andros
patent: 5351360 (1994-10-01), Suzuki et al.
patent: 5725414 (1998-03-01), Moinpour et al.
patent: 5852560 (1998-12-01), Takeyama et al.
patent: 5861066 (1999-01-01), Moinpour et al.
patent: 5868857 (1999-02-01), Moinpour et al.

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