X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1997-07-29
1999-01-19
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 86, G01B 1502
Patent
active
058621997
ABSTRACT:
The present invention provides a method and apparatus for nondestructive, in situ measuring thicknesses of layers on substrates. The method and device uses a probe including a radioactive source in a source holder and a photodetector mounted behind the source for detection of backscattered photons. In one aspect the method is used to measure the thickness of paint deposited onto metal substrates. The source holder and photodetector array forms a cylindrically symmetric probe for producing an axially symmetric beam of primary photons. A source containing radioactive .sup.109 Cd producing high energy photons of energy 22 and 25 keV is spaced from the painted surface so the photons impinge on the painted substrate. The intensity of photons backscattered by Compton scattering in the paint layer is proportional to the mass density of the paint to give a direct measurement of the paint thickness. The photons penetrating through to the substrate are absorbed within the substrate.
REFERENCES:
patent: 3854042 (1974-12-01), Ott
Church Craig E.
Hill Nancy E.
Schumacher Lynn C.
University of Guelph
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