Communications: electrical – Condition responsive indicating system – Specific condition
Patent
1998-10-05
2000-04-11
Lee, Benjamin C.
Communications: electrical
Condition responsive indicating system
Specific condition
340580, 25032009, 378 89, 702137, 702172, G08B 1902
Patent
active
060492821
ABSTRACT:
The present invention provides a method and apparatus for in situ measuring thicknesses of ice buildup on airfoil. The method and device uses a probe including a radioactive .sup.241 Am gamma ray source producing 60 keV gamma ray photons which penetrate through the airfoil substrate and a photodetector mounted behind the source for detection of backscattered gamma rays. The probe is mounted on the interior of the airfoil and secondary radiation is backscattered within the ice layer and back through the airfoil substrate to the photodetector. The shape and density of the source holder in addition to the geometrical arrangement of the source and detector with respect to the airfoil substrate are used to block a substantial fraction of gamma rays backscattered in the airfoil substrate thereby favoring scattering in the ice layer over that in the airfoil material.
REFERENCES:
patent: 3914607 (1975-10-01), Cho et al.
patent: 4047029 (1977-09-01), Allport
patent: 4054255 (1977-10-01), Magenheim
patent: 4593533 (1986-06-01), Alsenz
patent: 4628736 (1986-12-01), Kirby et al.
patent: 4646068 (1987-02-01), Skala
patent: 4688185 (1987-08-01), Magenheim et al.
patent: 4701868 (1987-10-01), Regimand
patent: 4797660 (1989-01-01), Rein, Jr.
patent: 4851817 (1989-07-01), Brossia et al.
patent: 5014042 (1991-05-01), Michoud et al.
patent: 5195117 (1993-03-01), Ong
patent: 5296853 (1994-03-01), Federov et al.
patent: 5351689 (1994-10-01), MacKenzie
patent: 5446288 (1995-08-01), Tumer
patent: 5557108 (1996-09-01), Tumer
patent: 5821862 (1998-10-01), MacKenzie
Hill Nancy E.
Lee Benjamin C.
Schumacher Lynn C.
University of Guelph
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