Data processing: measuring – calibrating – or testing – Measurement system – Dimensional determination
Reexamination Certificate
2005-09-16
2008-09-02
Raymond, Edward (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system
Dimensional determination
C073S105000, C073S850000, C250S307000
Reexamination Certificate
active
07421370
ABSTRACT:
A scanning probe microscope (SPM) based measuring technique for measuring surface features of a sample fits a curve to a family of feature edge points acquired as a result of an SPM scan of the surface feature. If two curves are fit on opposed edges of the feature of interest, the maximum or minimum distance between those curves can be determined to ascertain a dimension of interest such as a maximum via width, a minimum line width, etc. The scan is preferably a relatively low-resolution scan in the Y direction, typically having 8-12 scan profiles passing through the feature of interest low-resolution, which is about half that typically used by prior techniques. The low-resolution scan can be performed relatively rapidly and with high repeatability. Repeatability is also higher than with prior techniques, and the level of repeatability is relatively insensitive to the resolution in the Y direction. Using a low-resolution scan also significantly reduces tip wear and increases throughput when compared to high-resolution scans.
REFERENCES:
patent: 5226801 (1993-07-01), Cobile
patent: RE34489 (1993-12-01), Hansma et al.
patent: 5412980 (1995-05-01), Elings et al.
patent: 5644512 (1997-07-01), Chernoff et al.
patent: 5825670 (1998-10-01), Chernoff et al.
patent: 6388252 (2002-05-01), Takahashi et al.
patent: 6873747 (2005-03-01), Askary
patent: 7067806 (2006-06-01), Watanabe et al.
patent: 7143005 (2006-11-01), Dahlen et al.
patent: 2005/0043917 (2005-02-01), Dahlen et al.
patent: 07222192 (1995-08-01), None
Balk et al., ‘Thermal Analysis by Means of Scanning Probe Microscopy’, 1997, IEEE Publication, pp. 1-6.
Shen et al., ‘Couple Passive Voltage Contrast with Scanning Probe Microscope to Identify Invisible Defect Out’, May 2005, pp. 290-293.
Katagiri et al., ‘Scanning-probe Microscope Using an Ultrasmall Coupled-Cavity Laser Distortion Sensor Based on Mechanical Negative-Feedback Stabilization’, 1998, IOP Publication, pp. 1441-1445.
Yen, ‘A Qualitative Profile-Based Approach to Edge Detection’, Sep. 2003, PhD Dissertation, New York University, pp. 1-135.
Via Analysis, Description of Veeco Instruments, Inc. XSM Software, undated.
J.C. Russ,Segmentation and Thresholding,The Image Processing Handbook, Third Edition, pp. 371-429, (Undated), CRC Handbook published in cooperation with IEE Press.
Jain Rohit
Richards John
Desta Elias
Raymond Edward
Veeco Instruments Inc.
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