Method and apparatus for material deposition

Details Method and apparatus for material deposition Method and apparatus for material deposition

1992-12-18

1995-10-10

Breneman, R. Bruce

Coating processes

Coating by vapor, gas, or smoke

Metal coating

118715, 118724, 427421, H01L 2100

Patent

active

054569451

ABSTRACT:
A method and apparatus are disclosed for forming thin films of chemical compounds utilized in integrated circuits. The method includes steps of forming a precursor liquid comprising a chemical compound in a solvent, providing a substrate within a vacuum deposition chamber, producing a mist of the precursor liquid, and flowing the mist into the deposition chamber while maintaining the chamber at ambient temperature to deposit a layer of the precursor liquid on the substrate. The liquid is dried to form a thin film of a solid material on the substrate, then the integrated circuit is completed to include at least a portion of the film of solid material in a component of the integrated circuit.

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