Cleaning and liquid contact with solids – Processes – Combined
Reexamination Certificate
2011-08-23
2011-08-23
Markoff, Alexander (Department: 1711)
Cleaning and liquid contact with solids
Processes
Combined
C134S001000, C134S001300, C134S006000, C134S033000, C134S037000, C134S153000, C134S184000, C134S200000, C134S902000, C015S021100, C015S097100
Reexamination Certificate
active
08002899
ABSTRACT:
Aspects of the invention generally provide methods and apparatus for cleaning adhesive residual on a photomask substrate. In one embodiment, the apparatus includes a processing cell, a support assembly configured to receive a photomask substrate disposed thereon disposed in the processing cell, a protection head assembly disposed above and facing the support assembly, and a head actuator configured to control the elevation of the protection head assembly relative to an upper surface of the support assembly. A cleaning device is provided and positioned to interact with the photomask substrate disposed on the support assembly. In another embodiment, a method of cleaning a periphery region of a photomask substrate includes providing a photomask substrate having a periphery portion and a center portion disposed on a support assembly in a processing cell, lowering a protection cover disposed in the processing cell to cover the center portion of the photomask substrate, providing a brush in the processing cell to clean the periphery portion of the photomask substrate.
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Jeon Chung-Huan
Kumar Ajay
Lee Richard
Papanu James S.
Wu Banqiu
Applied Materials Inc.
Markoff Alexander
Patterson & Sheridan L.L.P.
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