Semiconductor device manufacturing: process – With measuring or testing
Reexamination Certificate
2006-09-13
2008-07-22
Estrada, Michelle (Department: 2823)
Semiconductor device manufacturing: process
With measuring or testing
C029S025010, C257SE21529, C257SE21521
Reexamination Certificate
active
07402444
ABSTRACT:
A method of manufacturing a semiconductor device using a wafer emissivity calculated from a wafer reflectivity to calculate a wafer temperature and to calculate target values for heat source optical intensities provided to a plurality of heat sources which heat the wafer and a substrate peripheral structure.
REFERENCES:
patent: 6780657 (2004-08-01), Ino et al.
patent: 2005/0112788 (2005-05-01), Borden et al.
patent: 2006/0100735 (2006-05-01), Hauf et al.
patent: 2001-274109 (2001-10-01), None
Itokawa Hiroshi
Kawase Yoshimasa
Estrada Michelle
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
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