Method and apparatus for managing manufacturing equipment,...

Data processing: generic control systems or specific application – Generic control system – apparatus or process – Sequential or selective

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S048000, C700S095000, C700S096000, C700S108000, C700S110000, C700S116000, C700S117000, C702S035000

Reexamination Certificate

active

07848828

ABSTRACT:
Provided is a method for managing manufacturing apparatuses used in a managed production line including a plurality of manufacturing processes for manufacturing an electronic device, each of the apparatuses being used in one or more of the processes. The method includes acquiring a property of a reference device manufactured in a predetermined reference production line including the manufacturing processes to be performed, performing at least one of the manufacturing processes in the managed production line, performing the other manufacturing processes in the reference production line, and manufacturing a comparison device. The method further includes measuring a property of the comparison device, comparing the measured properties of the reference and the comparison devices, and judging whether a manufacturing apparatus used in the at least one manufacturing process in the managed production line is defective or not, based on a property difference between the reference and the comparison devices.

REFERENCES:
patent: 4175317 (1979-11-01), Aoki et al.
patent: 4631686 (1986-12-01), Ikawa et al.
patent: 4766395 (1988-08-01), Dolby
patent: 4901242 (1990-02-01), Kotan
patent: 5103557 (1992-04-01), Leedy
patent: 5682349 (1997-10-01), Campardo et al.
patent: 5689460 (1997-11-01), Ooishi
patent: 5793650 (1998-08-01), Mirza
patent: 5896294 (1999-04-01), Chow et al.
patent: 5933351 (1999-08-01), Balamurugan
patent: 5966527 (1999-10-01), Krivokapic et al.
patent: 5982662 (1999-11-01), Kobayashi et al.
patent: 6263255 (2001-07-01), Tan et al.
patent: 6314332 (2001-11-01), Kida
patent: 6341241 (2002-01-01), Mugibayashi et al.
patent: 6473665 (2002-10-01), Mugibayashi et al.
patent: 6507800 (2003-01-01), Sheu
patent: 6522939 (2003-02-01), Strauch et al.
patent: 6535769 (2003-03-01), Konar
patent: 6542830 (2003-04-01), Nakazato et al.
patent: 6629009 (2003-09-01), Tamaki
patent: 6649310 (2003-11-01), Itoh et al.
patent: 6757580 (2004-06-01), Shimada et al.
patent: 6889164 (2005-05-01), Okuda
patent: 7003368 (2006-02-01), Koike et al.
patent: 7006877 (2006-02-01), Hammon et al.
patent: 7052624 (2006-05-01), Matsutani et al.
patent: 7065460 (2006-06-01), Nishimura
patent: 7308367 (2007-12-01), Steele et al.
patent: 7381577 (2008-06-01), Slisher
patent: 7735055 (2010-06-01), Tsutsui et al.
patent: 2001/0018245 (2001-08-01), Kimizuka
patent: 2003/0069658 (2003-04-01), Yamazaki
patent: 2003/0130806 (2003-07-01), Mizuno et al.
patent: 2004/0147121 (2004-07-01), Nakagaki et al.
patent: 2006/0064191 (2006-03-01), Naya et al.
patent: 11-070445 (1999-03-01), None
patent: 2002-333919 (2002-11-01), None
Takahashi et al., “Oxygen Radical Treatment Applied to Ferroelectric Thin Film Films” 2003, Elsevier. p. 239-245.
“Office Action of Korean Counterpart Application” issued on Feb. 23, 2010, p. 1-p. 5.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for managing manufacturing equipment,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for managing manufacturing equipment,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for managing manufacturing equipment,... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4154731

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.