Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1983-12-12
1985-08-20
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430 5, 430 22, 430315, 430316, 430318, 430329, 427 96, G03F 702, G03F 900
Patent
active
045364702
ABSTRACT:
This invention concerns method and apparatus for making a mask conforming to a cured MLC substrate. The mask when made may be used to add layers of metallization to the cured substrate by conventional photolithographic techniques. The method and apparatus feature use of the cured substrate itself to pattern the mask. Particularly, the substrate is aligned with the unpatterned mask and the image of the substrate transferred to the mask such that once patterned, the mask may subsequently be realigned with the substrate. In preferred form, a system of notches and grooves are used to align the substrate and mask and a lens system used to transfer the substrate image to the mask. The invention also includes method and apparatus for making an improved MLC substrate. The improvement is characterized by the use of photolithographic techniques to add successive layers of metallization to the cured substrate. This is accomplished by use of a special fixture for combining and aligning the cured substrate with a conforming mask.
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"A Fabrication Technique for Multilayer Ceramic Module", by H. D. Kaiser et al., Solid State Technology, May 1972, pp. 35-40.
Amendola Albert
Christensen Richard G.
Yereance, Jr. John G.
Coca T. Rao
Dees Jos,e G.
International Business Machines - Corporation
Kittle John E.
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