Method and apparatus for magnetron sputtering

Details Method and apparatus for magnetron sputtering Method and apparatus for magnetron sputtering

1988-04-21

1989-04-25

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

204298, C23C 1434

Patent

active

048245402

ABSTRACT:
Magnetron type sputtering apparatus in which the magnetic field is provided by one or more electromagnets powered by an electric current derived from sputtering ion current. The magnetron sputtering source electromagnets are wound, insulated and connected so as to provide that the sputtering ion current, or a portion thereof, passes through the coils and thus powers the electromagnets. Thus, a plurality of electromagnets can be connected in parallel or in series and powered by the sputtering ion current.

REFERENCES:
patent: 4401539 (1983-08-01), Abe et al.

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