X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1989-03-24
1990-05-22
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 84, G01N 2320
Patent
active
049282948
ABSTRACT:
An improved asymmetric crystal topography x-ray imaging system employing a ine focus horizontal line source of x-rays and a crystal monochromator used in a compression mode. Relatively large horizontal and vertical dimensions of the monochromating crystal allow imaging of larger areas of imperfect crystals than previously possible, without adversely affecting image resolution. The high resolution two-dimensional images are a direct consequence of our method of controlling the probe beam divergences. An appreciably enhanced and useful intensity of monochromatic x-rays is obtained over that available with prior asymmetric crystal topography systems.
REFERENCES:
patent: 3982127 (1976-09-01), Hartmann et al.
Armstrong Ronald W.
Beard, Jr. Warren T.
Church Craig E.
Maser Thomas O.
U.S. Government as represented by the Director, National Securit
Utermohle John R.
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