Method and apparatus for irradiating simulated solar radiation

Semiconductor device manufacturing: process – With measuring or testing – Electrical characteristic sensed

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C324S765010, C250S494100

Reexamination Certificate

active

10792715

ABSTRACT:
In a method of irradiating an object with simulated solar radiation using a plurality of light sources, the object is irradiated with simulated solar radiation resulting from superimposed light rays from a plurality of light sources including light sources having different times at which light emission output reaches a peak.

REFERENCES:
patent: 3555351 (1971-01-01), Sherwin
patent: 4417182 (1983-11-01), Weber
patent: 4641227 (1987-02-01), Kusuhara
patent: 5740314 (1998-04-01), Grimm
patent: 5924784 (1999-07-01), Chliwnyj et al.
patent: 5942048 (1999-08-01), Fujisaki et al.
patent: 6051778 (2000-04-01), Ichinose et al.
patent: 6154034 (2000-11-01), Lovelady et al.
patent: 6169414 (2001-01-01), Yoshino et al.
patent: 6548819 (2003-04-01), Lovelady
patent: 7071476 (2006-07-01), Rothweiler et al.
patent: 2004/0020529 (2004-02-01), Schutt et al.
patent: 1 139 016 (2001-10-01), None
patent: 61-269801 (1986-11-01), None
patent: 11-26785 (1999-01-01), None
patent: 11-214165 (1999-06-01), None
patent: WO 02/03053 (2002-01-01), None
patent: 100 51 357 (2002-04-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for irradiating simulated solar radiation does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for irradiating simulated solar radiation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for irradiating simulated solar radiation will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3946650

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.