Method and apparatus for ion deposition and etching

Details Method and apparatus for ion deposition and etching Method and apparatus for ion deposition and etching

1988-06-27

1989-10-31

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156654, 20419211, 20419213, 20419234, 427 8, 427 38, B44C 122, C03C 1500, C23C 1400, B05D 306

Patent

active

048774790

ABSTRACT:
The disclosure relates to maskless deposition and etching and more particularly to maskless deposition and etching of the surface of objects using single and multiple ion sources.

REFERENCES:
patent: 3548189 (1970-12-01), Meinel et al.
patent: 3699334 (1972-10-01), Cohen et al.
patent: 4367044 (1983-01-01), Booth, Jr. et al.
patent: 4405989 (1983-09-01), Tsukada et al.
patent: 4411733 (1983-10-01), Macklin et al.
patent: 4450031 (1984-05-01), Ono et al.
patent: 4457803 (1984-07-01), Takigawa
patent: 4523971 (1985-06-01), Cuomo et al.
Sensitive Technique for Measuring Apparent Optical Figure Error Caused by Coating Nonuniformity, by H. E. Bennett and D. K. Burge; Proc. Boulder Damage Symposium 1981, Laser Induced Damage in Optical Materials: 1981, NBS Special Pub. 638, pp. 421-425.
Fundamentals of Ion-Source Operation by Harold R. Kaufman.
Journal of Vacuum Science and Technology, vol. 15, pp. 272-276 Mar./Apr. 1978, by H. F. Kaufman, et al.

Affiliated with

Also associated with

Rating

Method and apparatus for ion deposition and etching does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for ion deposition and etching, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for ion deposition and etching will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-623819