Method and apparatus for intra-layer transitions and...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07013452

ABSTRACT:
An apparatus is disclosed that substantially reduces or eliminates the resonance that occurs in vias that connect the layers of a printed circuit board by electrically coupling a first transmission line in a circuit board to a second transmission line in a circuit board by two electrical paths having substantially the same electrical length. The two electrical paths are created by connecting the first transmission line to a first via which is in turn connected to a second via having a second transmission line with a plurality of connecting electrical paths between the two vias. In one illustrative embodiment, electrical traces are used to connect the top of the first via to the top of the second via and the bottom of the first via to the bottom of the second via.

REFERENCES:
patent: 5438297 (1995-08-01), Rahal-Arabi et al.
patent: 5646368 (1997-07-01), Muyshondt et al.
patent: 6388208 (2002-05-01), Kiani et al.
patent: 6528733 (2003-03-01), Takenaka et al.
patent: 6608535 (2003-08-01), Sherman et al.
patent: 6622370 (2003-09-01), Sherman et al.
patent: 6640332 (2003-10-01), Mitome et al.
Maeda, S., et al, “A Study on Measurement and Simulation for the Propagation Characteristics of Through-Hole”,Electronics&Communications in Japan, Part II—Electronics, Scripta Technica, Inc., New York, vol. 74, No. 7, (Jul. 1, 1991), pp. 61-72.
Kazuhiro, N., “Microstrip Line Resonance Element”,Patent Abstracts of Japan, vol. 1997, No. 9, (Sep. 30, 1997), 1 pages & JP 9 139611 A (Alps Electric Co Ltd), (May 27, 1997), 1 page.
European Search Report for Application No. 04250909.1 (Jun. 1, 2004), 4 pages,.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for intra-layer transitions and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for intra-layer transitions and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for intra-layer transitions and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3564219

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.