Method and apparatus for inspecting pattern defects

Details Method and apparatus for inspecting pattern defects Method and apparatus for inspecting pattern defects

2006-09-11

2009-02-10

Toatley, Jr., Gregory J (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237200, C250S365000, C250S503100, C250S50400H

Reexamination Certificate

active

07489395

ABSTRACT:
A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.

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