Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2005-05-31
2008-05-13
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
Reexamination Certificate
active
07372561
ABSTRACT:
The present invention relates to a high-sensitivity defect inspection method, apparatus, and system adapted for the fine-structuring of patterns; wherein, in addition to a cleaning tank which chemically cleans a sample and rinses the sample, a defect inspection apparatus having a liquid-immersion element by which the interspace between the sample and the objective lens of an optical system is filled with a liquid, and a drying tank which dries the sample, the invention uses liquid-immersion transfer means from said cleaning tank through said liquid-immersion means of said defect inspection apparatus to said drying tank so that the sample is transferred in a liquid-immersed state from said cleaning tank to said liquid-immersion means.
REFERENCES:
patent: 6571657 (2003-06-01), Olgado et al.
patent: 6935930 (2005-08-01), Fujita
patent: 7130037 (2006-10-01), Lange
patent: 2005/0052642 (2005-03-01), Shibata et al.
patent: 2000-155099 (2000-06-01), None
patent: WO 99/49504 (1999-09-01), None
Maeda Shunji
Okabe Takafumi
Shibata Yukihiro
Takahara Yoichi
Antonelli, Terry Stout & Kraus, LLP.
Hitachi High-Technologies Corporation
Toatley , Jr. Gregory J.
Valentin II Juan D
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