Method and apparatus for inspecting defects and a system for...

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07372561

ABSTRACT:
The present invention relates to a high-sensitivity defect inspection method, apparatus, and system adapted for the fine-structuring of patterns; wherein, in addition to a cleaning tank which chemically cleans a sample and rinses the sample, a defect inspection apparatus having a liquid-immersion element by which the interspace between the sample and the objective lens of an optical system is filled with a liquid, and a drying tank which dries the sample, the invention uses liquid-immersion transfer means from said cleaning tank through said liquid-immersion means of said defect inspection apparatus to said drying tank so that the sample is transferred in a liquid-immersed state from said cleaning tank to said liquid-immersion means.

REFERENCES:
patent: 6571657 (2003-06-01), Olgado et al.
patent: 6935930 (2005-08-01), Fujita
patent: 7130037 (2006-10-01), Lange
patent: 2005/0052642 (2005-03-01), Shibata et al.
patent: 2000-155099 (2000-06-01), None
patent: WO 99/49504 (1999-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for inspecting defects and a system for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for inspecting defects and a system for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for inspecting defects and a system for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3981512

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.