Method and apparatus for inspecting an EUV mask blank

Details Method and apparatus for inspecting an EUV mask blank Method and apparatus for inspecting an EUV mask blank

2005-11-08

2005-11-08

Le, Thien M. (Department: 2876)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

Reexamination Certificate

active

06963395

ABSTRACT:
An apparatus and method for at-wavelength EUV mask-blank characterization for inspection of moderate and low spatial frequency coating uniformity using a synchrotron or other source of EUV light. The apparatus provides for rapid, non-destruction, non-contact, at-wavelength qualification of large mask areas, and can be self-calibrating or be calibrated to well-characterized reference samples. It can further check for spatial variation of mask reflectivity or for global differences among masks. The apparatus and method is particularly suited for inspection of coating uniformity and quality and can detect defects in the order of 50 μm and above.

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