Method and apparatus for inspecting a pattern shape

Details Method and apparatus for inspecting a pattern shape Method and apparatus for inspecting a pattern shape

2009-04-17

2011-10-18

Tran, Thang (Department: 2627)

Dynamic information storage or retrieval

Condition indicating, monitoring, or testing

C369S053150, C356S237300

Reexamination Certificate

active

08040772

ABSTRACT:
An apparatus for inspecting a pattern shape of a magnetic record medium or its stamper includes: a moving mechanism, on which an object to be inspected where a pattern is formed is placed and which moves the object to be inspected in a radial direction while rotating the object; an irradiating optical system that applies illuminating light of a wide band including far ultraviolet light to the object to be inspected moved in the radial direction while rotating the object by the moving mechanism in a polarized state suitable for the object to be inspected from an oblique direction; a detecting optical system that detects zero-order reflected light generated from the object to be inspected irradiated by the irradiating optical system; and a shape inspection unit that inspects a pattern shape formed on the object to be inspected based on a spectral reflectance waveform obtained by dispersing the detected zero-order reflected light, thereby inspecting the pattern shape at a high speed and with high sensitivity.

REFERENCES:
patent: 4180830 (1979-12-01), Roach
patent: 5774222 (1998-06-01), Maeda et al.
patent: 6512578 (2003-01-01), Komatsu et al.
patent: 6621568 (2003-09-01), Yonezawa
patent: 6903888 (2005-06-01), Leigh et al.
patent: 7623427 (2009-11-01), Jann et al.
patent: 7672799 (2010-03-01), Shimura et al.
patent: 2003/0011760 (2003-01-01), Vaez-Iravani et al.
patent: 2003/0178588 (2003-09-01), Ota
patent: 2004/0246476 (2004-12-01), Bevis et al.
patent: 2007/0046931 (2007-03-01), Oomori et al.
patent: 2007/0076195 (2007-04-01), Yamaguchi et al.
patent: 2008/0291436 (2008-11-01), Aiko et al.
patent: 2009/0002695 (2009-01-01), Saito et al.
patent: 2003-149159 (2003-05-01), None
patent: 2007-526444 (2007-09-01), None
patent: 2007-304062 (2007-11-01), None
patent: 2009-004610 (2009-01-01), None
patent: WO 2004/111623 (2004-12-01), None
Yang et al., “Line-profile and critical dimension correlation between a normal incidence optical CD metrology system and SEM”, Proc. SPIE vol. 4689, 2002, pp. 966-976.

Affiliated with

Also associated with

Rating

Method and apparatus for inspecting a pattern shape does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for inspecting a pattern shape, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for inspecting a pattern shape will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4292881