Measuring and testing – Instrument proving or calibrating – Volume of flow – speed of flow – volume rate of flow – or mass...
Reexamination Certificate
2009-01-15
2010-11-02
Raevis, Robert R (Department: 2856)
Measuring and testing
Instrument proving or calibrating
Volume of flow, speed of flow, volume rate of flow, or mass...
Reexamination Certificate
active
07823436
ABSTRACT:
Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.
REFERENCES:
patent: 4285245 (1981-08-01), Kennedy
patent: 5062446 (1991-11-01), Anderson
patent: 5684245 (1997-11-01), Hinkle
patent: 5868159 (1999-02-01), Loan et al.
patent: 5925829 (1999-07-01), Laragione et al.
patent: 6216726 (2001-04-01), Brown et al.
patent: 6363958 (2002-04-01), Ollivier
patent: 6450200 (2002-09-01), Ollivier
patent: 6948508 (2005-09-01), Shajii et al.
patent: 7136767 (2006-11-01), Shajii et al.
patent: 7204158 (2007-04-01), Morgan et al.
patent: 2009/0183549 (2009-07-01), Monkowski et al.
patent: 2009/0266139 (2009-10-01), Gregor et al.
International Search Report for PCT Application No. PCT/US2009/31170 dated Mar. 23, 2009.
Chalmers James MacAllen
Chen Jialing
Ding Tao
Monkowski Joseph R.
Bach, Esq. Joseph
Nixon & Peabody LLP.
Pivotal Systems Corporation
Raevis Robert R
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