Method and apparatus for in-situ end-point detection and optimiz

Details Method and apparatus for in-situ end-point detection and optimiz Method and apparatus for in-situ end-point detection and optimiz

1997-05-28

2000-11-14

Rose, Robert A.

Abrading

Abrading process

Glass or stone abrading

451 6, 451 9, 451 10, 451288, B24B 100

Patent

active

061462489

ABSTRACT:
A linear polishing belt for use in chemical-mechanical polishing (CMP) of a substrate comprises an opening and a flexible monitoring window secured to the belt to close the opening and to create a monitoring channel in the belt. A plurality of monitoring channels can also be used. A film thickness monitor comprising an interferometer can be disposed alongside the belt or at least partially within a region bound by it. The monitoring channel and the film thickness monitor can be used in the CMP process to determine the end point of the CMP process, determine removal rate at any given circumference of a substrate, determine average removal rate across a substrate surface, determine removal rate variation across a substrate surface, and optimize removal rate and uniformity.

REFERENCES:
patent: 3841031 (1974-10-01), Walsh
patent: 4193226 (1980-03-01), Gill, Jr. et al.
patent: 4308586 (1981-12-01), Coates
patent: 4462860 (1984-07-01), Szmanda
patent: 4516855 (1985-05-01), Korth
patent: 4647207 (1987-03-01), Bjork et al.
patent: 4653924 (1987-03-01), Itonaga et al.
patent: 4681450 (1987-07-01), Azzan
patent: 4710030 (1987-12-01), Tauc et al.
patent: 4776695 (1988-10-01), van Pham et al.
patent: 4793895 (1988-12-01), Kaunta et al.
patent: 4811522 (1989-03-01), Gill, Jr.
patent: 4844617 (1989-07-01), Kelderman et al.
patent: 4927432 (1990-05-01), Budinger et al.
patent: 4954141 (1990-09-01), Takiyama et al.
patent: 4957368 (1990-09-01), Smith
patent: 5020283 (1991-06-01), Tuttle
patent: 5036015 (1991-07-01), Sandhu et al.
patent: 5042951 (1991-08-01), Sold et al.
patent: 5061072 (1991-10-01), Folkard et al.
patent: 5067805 (1991-11-01), Corle et al.
patent: 5081421 (1992-01-01), Mjuer et al.
patent: 5081796 (1992-01-01), Schultz
patent: 5166752 (1992-11-01), Spanaer et al.
patent: 5177908 (1993-01-01), Tuttle
patent: 5197999 (1993-03-01), Thomas
patent: 5213655 (1993-05-01), Leach et al.
patent: 5240552 (1993-08-01), Yu et al.
patent: 5297364 (1994-03-01), Tuttle
patent: 5298110 (1994-03-01), Schoenborn et al.
patent: 5306916 (1994-04-01), Norton et al.
patent: 5308438 (1994-05-01), Cote et al.
patent: 5321304 (1994-06-01), Rostomer
patent: 5329732 (1994-07-01), Karlsrud et al.
patent: 5337015 (1994-08-01), Lustig et al.
patent: 5413941 (1995-05-01), Kous et al.
patent: 5433650 (1995-07-01), Winebarger
patent: 5433651 (1995-07-01), Lustig et al.
patent: 5439551 (1995-08-01), Mejkie et al.
patent: 5461007 (1995-10-01), Kobayashi
patent: 5486129 (1996-01-01), Sandhu et al.
patent: 5486701 (1996-01-01), Norton et al.
patent: 5489233 (1996-02-01), Cook et al.
patent: 5517312 (1996-05-01), Finarou
patent: 5554064 (1996-09-01), Brejuosel et al.
patent: 5558568 (1996-09-01), Talteh et al.
patent: 5595526 (1997-01-01), Yau et al.
patent: 5597442 (1997-01-01), Chen et al.
patent: 5605760 (1997-02-01), Roberts
patent: 5609517 (1997-03-01), Lofaro
patent: 5643044 (1997-07-01), Lund
patent: 5658183 (1997-08-01), Sandhu et al.
patent: 5762536 (1998-06-01), Pant et al.
patent: 5816891 (1998-10-01), Woo
patent: 5838447 (1998-11-01), Hiyama et al.
Parikh et al., "Oxide CMP on High-Throughput Orbital Polisher," Feb. 13-14, 1997 CMP-MIC Conference.
Fanton, et al., "Multiparameter Measurements of Thin Films Using Beam-Profile Reflectometry," Journal of Applied Physics, vol. 73, No. 11, pp. 7035-7040 Jun. 1, 1993.
Fanton, et al., "A Novel Technique for Performing Ellipsometric Measurements in a Sub-Micrometer Area".
OPTI-PROBE.TM. Brochure, Therma-Wave, Inc., 1995.
European Search Report for European Patent Application EP98304224.3; (3 Pages).
Hariharan, P., "Optical Interferometry" Academic Press, Sydney, pp. V-XI, 1-9, 37-95 (1985).
Steel, W.H., "Interferometry," Cambridge University Press, Cambridge, pp. V-XI, 26-59, 232-251 (1983).
T. Cleary and C. Barnes, "Orbital Polishing Techniques for CMP," Proceedings of 1996 VMIC Conference, p. 443 (Jun. 1996).
Holger, Grahn, Maris & Tauc, "Picosecond Ultrasonics," IEEE Journal of Qauntum Electronics, vol. 25, No. 12, pp. 2562-2569 (Dec. 1989).
European Search Report and Annex with "Lack of Unity of Invention--Sheet B" for EP98304242.
European Search Report and Annex for EP98304212.

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