Method and apparatus for improving the uniformity ion bombardmen

Details Method and apparatus for improving the uniformity ion bombardmen Method and apparatus for improving the uniformity ion bombardmen

1987-09-10

1989-10-03

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419232, 204298, C23C 1434

Patent

active

048714330

ABSTRACT:
A magnetron sputtering apparatus and method, in which the ion flux bombarding the substrate is made uniform. Countermagnet means are chosen and positioned such that the vertical components of the countermagnet field are of opposite direction and equal magnitude to the vertical components of the cathode magnet in the vicinity of the substrate. Thus, the cathode magnetic field lines become substantially flat in the vicinity of the substrate and do not cause the ion flux to be distributed on the substrate surface in a non-uniform manner. Measurement of ion current density on the substrate surface during operation of the invention reveals that the invention provides substantially constant flux at all points on the substrate surface.

REFERENCES:
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patent: 4414086 (1983-11-01), Lamont, Jr.
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patent: 4581118 (1986-04-01), Class et al.
patent: 4627904 (1986-12-01), Mintz
patent: 4721553 (1988-01-01), Saito et al.

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