Optical: systems and elements – Having significant infrared or ultraviolet property
Patent
1994-02-18
1995-11-14
Lerner, Martin
Optical: systems and elements
Having significant infrared or ultraviolet property
219405, 219411, 359853, G02B 510, F27D 1100
Patent
active
054672201
ABSTRACT:
In a processing chamber that includes a wafer pedestal adapted to heat and cool a wafer during wafer processing, where the wafer is secured to the pedestal with a wafer clamp ring, a yoke having a surface in spaced facing relation with a wafer surface is positioned atop the clamp ring proximate to the wafer. The yoke surface includes a concave circumferential portion that is curved to provide a reflector, for example a parabolic or elliptical reflector, that is positioned having a focal point coincident with the wafer edge. Reflector positioning and spacing relative to the wafer surface encourage reflection of heat radiated from the edge portion of the wafer surface back to the wafer edge to mitigate thermal losses at the wafer edge and improve temperature uniformity across the surface of the wafer.
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Applied Materials Inc.
Glenn Michael A.
Lerner Martin
Stern Robert J.
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