Method and apparatus for improved focus ring

Details Method and apparatus for improved focus ring Method and apparatus for improved focus ring

2006-02-21

2006-02-21

Vo, Tuyet Thi (Department: 2821)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With workpiece support

C156S345510, C156S345540, C204S298280, C204S298230, C118S730000, C118S728000

Reexamination Certificate

active

07001482

ABSTRACT:
A focus ring assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a focus ring having one or more wear indicators for determining the lifetime of the focus ring, wherein the coupling of the focus ring to the substrate holder facilitates auto-centering of the focus ring in the plasma processing system. For example, a centering ring mounted on the substrate holder can comprise a centering feature configured to couple with a mating feature on the focus ring.

REFERENCES:
patent: 5556500 (1996-09-01), Hasegawa et al.
patent: 6815352 (2004-11-01), Tamura et al.
patent: 6837966 (2005-01-01), Nishimoto et al.
patent: 2001/0015262 (2001-08-01), Denpoh
patent: 2002/0072240 (2002-06-01), Koike
patent: 2004/0125360 (2004-07-01), Ludviksson et al.

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