Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2003-11-12
2008-12-09
MacArthur, Sylvia R (Department: 1792)
Coating apparatus
Gas or vapor deposition
With treating means
C118S7230ER, C156S345510
Reexamination Certificate
active
07461614
ABSTRACT:
A baffle plate assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a baffle plate having one or more openings to permit the passage of gas there through, wherein the coupling of the baffle plate to the substrate holder facilitates auto-centering of the baffle plate in the plasma processing system. For example, a centering ring mounted in the substrate holder can comprise a centering feature configured to couple with a mating feature on the baffle plate. After initial assembly of the plasma processing system, the baffle plate can be replaced and centered within the plasma processing system without disassembly and re-assembly of the substrate holder.
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English Translation of JP2002-252209 from www4.ipdl.ncipi.go.jp.
English Translation of JP2002-252209 from www4.ipdl.ncipi.go.jp, published Sep. 6, 2002.
Fink Steven T
Hyland Sandra
Laflamme, Jr. Arthur H
Strang Eric J
Wallace Jay
MacArthur Sylvia R
Tokyo Electron Limited
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