Method and apparatus for immersion lithography

Details Method and apparatus for immersion lithography Method and apparatus for immersion lithography

2007-06-12

2007-06-12

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for original

C355S053000, C355S072000, C355S073000, C355S076000

Reexamination Certificate

active

10904599

ABSTRACT:
An apparatus for holding a wafer and a method for immersion lithography. The apparatus, including a wafer chuck having a central circular vacuum platen, an outer region, and a circular groove centered on the vacuum platen, a top surface of the vacuum platen recessed below a top surface of the outer region and a bottom surface of the groove recessed below the top surface of the vacuum platen; one or more suction ports in the bottom surface of the groove; and a hollow toroidal inflatable and deflatable bladder positioned within the groove.

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