Method and apparatus for identifying defects in a substrate...

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C382S299000, C356S237100

Reexamination Certificate

active

10379236

ABSTRACT:
A surface inspection apparatus in accordance with the principles of the invention includes an optical system having a plurality of time delay integration (TDI) sensors. The plurality of TDI sensors are arranged to generate a plurality of images of an object so that the images are offset a sub-pixel distance from each other. A scanning element enables the TDI sensors to scan the object so successive images of the object can be generated. Image processing circuitry is used to process the plurality of successive images together to produce a reconstructed image of the object having increased pixel density. The embodiments of the invention also include methods for generating reconstructed images from a plurality of TDI images obtained from at least two offset TDI sensors.

REFERENCES:
patent: 4811409 (1989-03-01), Cavan
patent: 5341436 (1994-08-01), Scott
patent: 5446378 (1995-08-01), Reich et al.
patent: 5657402 (1997-08-01), Bender et al.
patent: 5822055 (1998-10-01), Tsai et al.
patent: 6184526 (2001-02-01), Kohama et al.
patent: 6194718 (2001-02-01), Dotan
patent: 6252218 (2001-06-01), Chou
patent: 6317512 (2001-11-01), Maeda et al.
patent: 6434280 (2002-08-01), Peleg et al.
patent: 6535650 (2003-03-01), Poulo et al.
patent: 6650704 (2003-11-01), Carlson et al.
patent: 6870609 (2005-03-01), Watkins et al.
patent: 7003177 (2006-02-01), Mendlovic et al.
patent: 2002/0171825 (2002-11-01), Krantz et al.
patent: 2002/0191825 (2002-12-01), Parekh et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for identifying defects in a substrate... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for identifying defects in a substrate..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for identifying defects in a substrate... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3827387

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.