Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to condition of coating material
Patent
1993-10-15
1995-03-28
Jones, W. Gary
Coating apparatus
Control means responsive to a randomly occurring sensed...
Responsive to condition of coating material
118696, 118719, 118725, 118726, 118728, B05C 1100, C23C 1600
Patent
active
054013160
ABSTRACT:
Adhesion apparatus for applying a hydrophobic treatment to a semiconductor wafer comprises a tank housing a treating agent of liquid HMDS and a process chamber into which a mixed gas consisting of a vaporized HMDS coming from the tank and a carrier gas is supplied for applying a hydrophobic treatment to a wafer surface. A supporting table on which the wafer is disposed during the hydrophobic treatment is provided within the process chamber. A heater and a cooling water passageway are housed in the supporting table for controlling the wafer temperature. A concentration measuring section for measuring the HMDS concentration in the waste gas is connected to the discharge pipe of the process chamber. The concentration measuring section is connected to a CPU serving to derive a temperature control signal from the measured value of the HMDS concentration. The temperature control signal is transmitted to a temperature control section. Upon receipt of the temperature control signal, the temperature control section permits controlling the current supply to the heater or the cooling water supply to the cooling water passageway so as to change the temperature of the supporting table.
REFERENCES:
patent: 4393013 (1983-07-01), McMenamin
patent: 4524126 (1985-06-01), Marinace et al.
patent: 4693211 (1987-09-01), Ogami et al.
patent: 4870923 (1989-10-01), Sugimoto
patent: 5091207 (1992-02-01), Tanaka
patent: 5190913 (1993-03-01), Higashiyama et al.
Hamada Tomoko
Shiraishi Masatoshi
Griffin Steven P.
Jones W. Gary
Tokyo Electron Kyushu Limited
Tokyo Electron Limited
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