Method and apparatus for high-resolution defect location and...

Details Method and apparatus for high-resolution defect location and... Method and apparatus for high-resolution defect location and...

2007-07-10

2007-07-10

Nguyen, Sang H. (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237200, C250S201300, C382S145000

Reexamination Certificate

active

10840730

ABSTRACT:
In the manufacture of integrated circuits on a wafer, it is necessary to monitor the manufacturing process by inspecting the ICs as to whether errors or defects have occurred during production. It is already known to use a scattered-light device (32) to determine whether a defect is present on the wafer. According to the present invention, defect examination is now improved in that defect-suspected regions (33) are identified using the scattered-light device (32). With a further examination system (30, 28) different from the scattered-light device (32), a determination is then made as to whether the defect-suspected regions (33) are defects. The latter can then also be classified.

REFERENCES:
patent: 5038048 (1991-08-01), Maeda et al.
patent: 5108176 (1992-04-01), Malin et al.
patent: 5153444 (1992-10-01), Maeda et al.
patent: 5801965 (1998-09-01), Takagi et al.
patent: 5859698 (1999-01-01), Chau et al.
patent: 5982920 (1999-11-01), Tobin et al.
patent: 5982921 (1999-11-01), Alumot et al.
patent: 6256093 (2001-07-01), Ravid et al.
patent: 6566671 (2003-05-01), Yoshida et al.
patent: 6608295 (2003-08-01), Engelhardt
patent: 6710868 (2004-03-01), Guetta
patent: 6765201 (2004-07-01), Uto et al.
patent: 0 524 348 (1993-01-01), None
patent: WO 99/14575 (1999-03-01), None
patent: WO 99/67626 (1999-12-01), None
patent: WO 00/02037 (2000-01-01), None

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