Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2006-04-04
2006-04-04
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C216S083000, C216S090000, C216S096000, C216S099000, C261S078200
Reexamination Certificate
active
07022244
ABSTRACT:
To supply microfine liquid droplets to a microscopic space for enabling micromachining and provide a method and an apparatus for forming the microfine liquid droplets, there is provided a method and an apparatus for generating liquid fine particles, comprising atomizing a liquid, fractionating the atomized liquid particles to form microfine liquid droplets by inertial fractionation and contacting the microfine liquid droplets with a heated carrier gas, thereby thermally drying the liquid particles to form finer particles.
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patent: 5782010 (1998-07-01), Boersen et al.
patent: 6189214 (2001-02-01), Skeath et al.
patent: 5-275401 (1993-10-01), None
Sakaida Atusi
Tanaka Hiroshi
Taniguchi Toshihisa
Ahmed Shamim
DENSO Corporation
Harness Dickey & Pierce PLC
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