Method and apparatus for generation of fine particles

Etching a substrate: processes – Etching of semiconductor material to produce an article...

Reexamination Certificate

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C216S083000, C216S090000, C216S096000, C216S099000, C261S078200

Reexamination Certificate

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07022244

ABSTRACT:
To supply microfine liquid droplets to a microscopic space for enabling micromachining and provide a method and an apparatus for forming the microfine liquid droplets, there is provided a method and an apparatus for generating liquid fine particles, comprising atomizing a liquid, fractionating the atomized liquid particles to form microfine liquid droplets by inertial fractionation and contacting the microfine liquid droplets with a heated carrier gas, thereby thermally drying the liquid particles to form finer particles.

REFERENCES:
patent: 5718863 (1998-02-01), McHugh et al.
patent: 5782010 (1998-07-01), Boersen et al.
patent: 6189214 (2001-02-01), Skeath et al.
patent: 5-275401 (1993-10-01), None

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