Method and apparatus for generating planarizing pattern and semi

Details Method and apparatus for generating planarizing pattern and semi Method and apparatus for generating planarizing pattern and semi

1997-03-13

1999-10-19

Teska, Kevin J.

Semiconductor device manufacturing: process

Formation of semiconductive active region on any substrate

Fluid growth from gaseous state combined with subsequent...

39550014, 438626, 438631, 438645, 438697, G06F 1750

Patent

active

059702389

ABSTRACT:
A dummy pattern is generated by enlarging a wiring pattern by a specified amount to generate an enlarged wiring pattern and deleting the overlapping portion of a first dummy original pattern composed of a group of squares with the enlarged wiring pattern. The dummy pattern is reduced by the specified amount to generate a reduced dummy pattern, which is enlarged by the specified amount to generate a planarizing pattern. The planarizing pattern is combined with the wiring pattern to generate a final pattern.

REFERENCES:
patent: 5341310 (1994-08-01), Gould et al.
patent: 5459093 (1995-10-01), Kuroda et al.
patent: 5488007 (1996-01-01), Kim et al.
patent: 5798298 (1998-08-01), Yang et al.
PTO 99-0312 (Translation of Japanese Patent Publication, Document No. 5-267,460, invented by Kitsukawa, published Oct. 15, 1993, translated Nov. 1998 by Schreiber Translations, Inc., 12 pages).
PTO 99-0311 (Translation of Japanese Patent, Document No. 8-160590, invented by Motoyama et al., published Jun. 21, 1996, translated by Schreiber Translations, Inc., 37 pages), Nov. 1998.
PTO 99-0391 (Translation of Japanese Published Unexamined (Kokai) Patent Application No. 6-61230, invented by Yamawaki, published Mar. 4, 1994, translated by Chisato Morohashi, USPTO Translation Branch, 7 pages), Nov. 5, 1998.

Affiliated with

Also associated with

Rating

Method and apparatus for generating planarizing pattern and semi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for generating planarizing pattern and semi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for generating planarizing pattern and semi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2067205