Method and apparatus for generating induced plasma

Details Method and apparatus for generating induced plasma Method and apparatus for generating induced plasma

1995-03-17

1997-10-21

Pascal, Robert

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511151, 21912111, 21912157, 21912152, H05H 126, H05H 130

Patent

active

056800142

ABSTRACT:
An induced plasma generating apparatus comprises: a seed gas supply unit for supplying a seed gas, a first chamber for receiving the seed gas: a DC current source; a pair of electrodes connected to the DC current source for causing a discharge in the first chamber to generate a plasma from the seed gas; a nozzle for ejecting the plasma from the first chamber; a second chamber for receiving the plasma ejected from the first chamber; an AC current source; and a coil connected to the AC current source and disposed to surround the second chamber for producing a magnetic field in the second chamber. An induced plasma is generated by subjecting plasma in the second chamber to the magnetic field.

REFERENCES:
patent: 3248513 (1966-04-01), Sunnen
patent: 3324334 (1967-06-01), Reed
patent: 3453474 (1969-07-01), Cann
patent: 4812166 (1989-03-01), Saiki et al.
patent: 5015493 (1991-05-01), Gruen
patent: 5233155 (1993-08-01), Frind

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