Method and apparatus for forming thin films using dual ECR plasm

Details Method and apparatus for forming thin films using dual ECR plasm Method and apparatus for forming thin films using dual ECR plasm

1997-06-04

2000-01-04

Nguyen, Nam

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427575, 118723MW, 118723MA, 31511141, H05H 102, H05H 130, C23C 1600, H01J 724

Patent

active

060107553

ABSTRACT:
An apparatus for forming thin films such as protective layers on both surfaces of a substrate of a magnetic memory device has an evacuable reaction chamber sandwiched between two electron cyclotron resonance plasma generators disposed on mutually opposite sides. Each plasma generator includes a wave guide for introducing microwave energy and a magnetic coil for providing a magnetic field for generating a plasma and causing the generated plasma to move to the substrate set inside the reaction chamber with a negative bias voltage applied thereto.

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