Method and apparatus for forming silicon oxide film

Details Method and apparatus for forming silicon oxide film Method and apparatus for forming silicon oxide film

2007-05-22

2007-05-22

Chen, Bret (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

C427S255370, C427S376200

Reexamination Certificate

active

10961025

ABSTRACT:
A method for forming a silicon oxide film includes disposing a silicon oxide film on a surface of a target substrate, and performing a reformation process on the silicon oxide film. The reformation process is performed by annealing the silicon oxide film while exposing the silicon oxide film to oxygen radicals and hydroxyl group radicals.

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