Method and apparatus for forming a multiple-element thin film ba

Details Method and apparatus for forming a multiple-element thin film ba Method and apparatus for forming a multiple-element thin film ba

1990-12-03

1992-02-18

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419213, 20429804, 20429803, C23C 1434

Patent

active

050891049

ABSTRACT:
Ion beams drawn out of a plurality of ion beam sources or neutralized beams derived therefrom are projected to a plurality of targets, and sputtered particles discharged from the targets are directed to a substrate. The composition of sputtered particles is measured in the vicinity to the substrate. The measured coomposition is compared with the predetermined reference value and the composition of sputtered particles is controlled based on the result of measurement. sputtered particles having a controlled composition distribution are deposited on the substrate thereby to form a multiple-element thin film.

REFERENCES:
patent: 4407709 (1983-10-01), Enjouji et al.
patent: 4637869 (1987-01-01), Glocker et al.
patent: 4673475 (1987-06-01), Windischmann
patent: 4793908 (1988-12-01), Scott et al.
patent: 4894132 (1990-01-01), Tanaka
patent: 4895631 (1990-01-01), Wirz et al.

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