Method and apparatus for forming a layer

Details Method and apparatus for forming a layer Method and apparatus for forming a layer

1988-01-04

1989-08-15

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

134 1, 156646, 156345, 118724, 118 501, 118620, 427 38, 427 531, 427 541, B44C 122, B05D 306, C03C 1500, C03C 2506

Patent

active

048571393

ABSTRACT:
A photo CVD apparatus includes a reaction chamber, a vacuum pump, and a light source chamber disposed in the reaction chamber, the light source chamber having a light window. A light source is provided in the light source chamber for irradiating the inside of the reaction chamber through the window. A device inputs reactive gas into the reaction chamber, and an electrode is disposed in the reaction space adjacent to the window and located between the substrate and the window. A method of depositing a layer on a substrate includes the steps of disposing a substrate in a reaction chamber, introducing a reactive gas, and initiating a photo-chemical reaction to deposit the product of the reaction on the substrate by irradiating the reactive gas with light emitted from a light source through a window of a light source chamber in which the light source is disposed. The substrate is then removed from the reaction chamber, and an etchant gas is introduced into the reaction chamber. A voltage is then applied between the substrate holder and an electrode which is located between the window and the substrate holder for carrying out plasma etching of the window.

REFERENCES:
patent: 4495218 (1985-01-01), Azuma et al.
patent: 4529474 (1985-07-01), Fujiyama et al.
patent: 4576698 (1986-03-01), Gallagher et al.

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