Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-04-07
2010-12-21
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S005000
Reexamination Certificate
active
07855046
ABSTRACT:
The invention includes a template useful for the fabrication of devices having one, two, or three dimensional geometries. The template can include at least a first patterned surface and a mask integrated into the template for creating an interference pattern when radiation is passed through the mask. The template can be useful in the production of shaped structures including one-, two-, or three-dimensionally shaped patterns, and further including at least one shaped surface.
REFERENCES:
patent: 5677089 (1997-10-01), Park et al.
patent: 6027595 (2000-02-01), Suleski
patent: 6071652 (2000-06-01), Feldman et al.
patent: 6638667 (2003-10-01), Suleski et al.
patent: 6900881 (2005-05-01), Sreenivasan et al.
patent: 6929762 (2005-08-01), Rubin
patent: 7235474 (2007-06-01), Dakshina-Murthy et al.
patent: 2005/0073671 (2005-04-01), Borodovsky
Satoru Shoji, Nicholas Smith, and Satoshi Kawata, “Photofabrication of a photonic crystal using interference of a UV laser,” Jun. 16, 1999, Proc. SPIE 3740, pp. 541-544 (1999).
Garrett J. Schneider, Eric D. Wetzel, Janusz A. Murakowski, and Dennis W. Prather, “Fabrication of three-dimensional Yablonovite photonic crystals by multiple-exposure UV interference lithography,” Jan. 25, 2005, Proc. SPIE 5720, pp. 9-17 (2005).
Colburn, et al., “Step and Flash Imprint Lithography for sub-100nm Patterning,” downloaded Apr. 5, 2006, THe University of Texas at Austin, http://www.molecularimprints,com/NewsEvents/tech—articles/UT—SFIL—SPIE—2000.pdf.
Suleski, et al., “Fabrication of high-spatial-frequency gratings through computer-generated near-field holography,” Optics Letters, vol. 24, No. 9, pp. 602-604, May 1, 1999.
Zanke, et al., “Large-area patterning for photonic crystals via coherent diffraction lithography,” J.Vac.Sci. Technol. B 22(6), pp. 3352-3355, Dec. 13, 2004.
Gil, et al., “The case for diffractive optics in maskless lithography,” J.Vac.Sci.Technol. B(21)(6), pp. 2810-2814, Dec. 5, 2003.
Flanders, et al., “Spatial period division—A new technique for exposing submicrometer-linewidth periodic and quasiperiodic patterns,” J.Vac.Sci.Technol., 16(6), pp. 1949-1952, Nov./Dec. 1979.
Divliansky, et al., “Fabrication of three-dimensional polymer photonic crystal structures using single diffraction element interference lithography,” Applied Physics Letters, vol. 82, No. 11, pp. 1667-1669, Mar. 17, 2003.
Jeon, et al., “Fabricating complex three-dimensional nanostructures with high-resolution conformable phase masks,” PNAS, vol. 101, No. 34, pp. 12428-12433, Aug. 24, 2004.
V. Berger, “From photonic band gaps to refractive index engineering,” Optical Materials., vol. 11, pp. 131-142, Elsevier Science B.V., Orsay, France, Jan. 1999.
Resnick, et al., “Imprint lithography for integrated circuit fabrication,” J.Vac.Sci.Technol. B21(6), pp. 2624-2631, Dec. 4, 2003.
Lin, et al., “Design and holographic fabrication of tetragonal and cubic photonic crystals with phase mask: toward the mass-production of three-dimensional photonic crystals,” Applied Physics Letters 86, 071117, pp. 1-3, American Institute of Physics, Feb. 10, 2005.
Xu, et al., “Centrifugation and spin-coating method for fabrication of three-dimensional opal and inverse-opal structures as photonic crystal devices,” Society of Photo-Optical Instrumentation Engineers,J. Microlith., Microfab., Microsyst., vol. 3, No. 1, pp. 168-173, Jan. 2004.
Suleski, et al., “Fabrication of optical microstructures through fractional Talbot imaging,” Proceedings of SPIE, vol. 5720, pp. 86-93, SPIE, Bellingham, WA, 2005.
Suleski, “Diffractive Optics Fabrication,” Encyclopedia of Optical Engineering, Marcel Dekker, Inc., pp. 374-387, 2003.
Suleski et al., “Fabrication Trends for Free-Space Microoptics,” Journal of Lightwave Technology, vol. 23, No. 2, pp. 633-646, Feb. 2005.
Blanchet et al., “Printing Techniques for Plastic Electronics,” Journal of Imaging Science and Technology, vol. 47, No. 4, pp. 296-303, Jul./Aug. 2003.
Piestun et al., “Synthesis of Three-Dimensional Light Fields and Applications,” Proceedings of the IEEE, vol. 90, No. 2, pp. 222-244, Feb. 2002.
Zanke et al., “Large-area patterning for photonic crystals via coherent diffraction lithography,” American Vacuum Society, vol. 22, No. 6, pp. 3352-3355, Nov./Dec. 2004.
Kunnavakkam et al., “Low-cost, low-loss microlens arrays fabricated by soft-lithography replication process,” American Institute of Physics, vol. 82, No. 8, pp. 1152-1154, Feb. 24, 2003.
Davies et al., “Applicaitons of precision diamond machining to the manufacture of micro-photonics components,” Proceedings of SPIE, vol. 5183, pp. 94-108, Bellingham, WA, 2003.
Mayers et al., “Crystallization of Mesoscopic Colloids into 3D Opaline Lattices in Packing Cells Fabricated by Replica Molding,” Advanced Materials.
Campbell et al., “Fabrication of photonic crystals for the visible spectrum by holographic lithography,” Nature, Macmillan Magazines Ltd., vol. 404, pp. 53-56, Mar. 2000.
Huff Mark F
Jelsma Jonathan
Summa, Additon & Ashe, P.A.
The University of North Carolina at Charlotte
LandOfFree
Method and apparatus for fabricating shaped structures and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for fabricating shaped structures and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for fabricating shaped structures and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4221125