Method and apparatus for evaluating pattern shape of a...

Details Method and apparatus for evaluating pattern shape of a... Method and apparatus for evaluating pattern shape of a...

2006-11-15

2009-11-10

Vanore, David A (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Methods

C250S310000

Reexamination Certificate

active

07615746

ABSTRACT:
The present invention provides a semiconductor pattern shape evaluating apparatus using a critical dimension SEM, which eliminates the necessity of data conversion corresponding to each process of semiconductor manufacturing conventionally required; controls possessed data integratedly; can select data effective for use in each process from the possessed data easily; if the shape of formed pattern changes with time, can create a photographing recipe which enables stable measurement by correcting the photographing recipe based on time-series data. Specifically, the semiconductor pattern shape evaluating apparatus correlates coordinate systems among diversified data to control the diversified data stored in a database integratedly, selects part or all of the diversified data arbitrarily and creates a photographing recipe for observing a semiconductor pattern with a critical dimension SEM using selected data.

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patent: 2000-348658 (2000-12-01), None

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