Method and apparatus for etching surface with excited gas

Details Method and apparatus for etching surface with excited gas Method and apparatus for etching surface with excited gas

1989-02-28

1990-11-27

Simmons, David

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 118 501, 427 38, 31511131, 361235, 376128, C23F 100

Patent

active

049733818

ABSTRACT:
A system (10) is provided for etching a surface (14). A vacuum enclosure (12) is provided to create a vacuum around containers (13) and the surface to be etched (14). A pressurized gas source (16) is utilized to input gas into the containers (13). A wire coil (38) is wrapped around the containers (13) and provided with an oscillator (40) to generate radio frequency energy. The radio frequency energy excites the gas within the containers (13) which is then discharged through an output opening (46) toward the surface to be etched (14). A vacuum pump (20) is provided to evacuate the enclosure (12).

REFERENCES:
patent: 3437864 (1969-04-01), Kofoid et al.
patent: 4088926 (1978-05-01), Fletcher et al.
patent: 4609428 (1986-09-01), Fujimura
patent: 4645977 (1987-02-01), Kurokawa et al.
patent: 4662977 (1987-05-01), Motley et al.
Downey et al.; "Introduction to Reactive Ion Beam Etching", Solid State Technology, Feb. 1981, pp. 121-127.

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