Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2007-07-31
2007-07-31
Smith, Zandra V. (Department: 2822)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S710000, C438S711000, C438S712000
Reexamination Certificate
active
10927807
ABSTRACT:
A method and apparatus for etching material layers with high uniformity of a lateral etch rate across a substrate using a gas mixture that includes a passivation gas. The passivation gas is provided to a peripheral region of the substrate to passivate sidewalls of the structures being etched.
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Liu Wei
Mui David
Applied Materials Inc.
Au Bac H.
Patterson & Sheridan LLP
Smith Zandra V.
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