Method and apparatus for endpoint detection in a chemical/mechan

Details Method and apparatus for endpoint detection in a chemical/mechan Method and apparatus for endpoint detection in a chemical/mechan

1994-11-30

1997-01-21

Rose, Robert A.

Abrading

Precision device or process - or with condition responsive...

With indicating

451 5, 451 41, B24B 4900, B24B 1922

Patent

active

055955266

ABSTRACT:
A method for polishing the surface of a substrate that overcomes the problems inherent in the prior art. During the polishing of a substrate, a quantity is calculated which is approximately proportional to a share of the total energy the polisher is consuming. Once this calculated quantity reaches a predetermined amount, it is detected.

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patent: 5245794 (1993-09-01), Salugsugan
patent: 5308438 (1994-05-01), Cote et al.
patent: 5337015 (1994-08-01), Lustig et al.

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