Method and apparatus for efficiently locating and...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000, C716S030000

Reexamination Certificate

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07096447

ABSTRACT:
An exemplary CAD design flow modifies an existing large scale chip layout to reinforce the redundant via design rules to improve the yield and reliability. The flow operates on each metal-via pair from bottom up to locate and correct isolated via rule violations by adding metal features and vias in a respective patch cell associated with each cluster cell. A large complex design is thus divided into cells so that multiple processes can work concurrently as if every process were working on the top level of the design layout.

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